II.
LibraryProcess JSON
Structured · livelib-process:nanotechnology--thin-film-deposition
specializations/domains/science/nanotechnology/thin-film-deposition json
Inspect the normalized record payload exactly as the atlas UI reads it.
{
"id": "lib-process:nanotechnology--thin-film-deposition",
"_kind": "LibraryProcess",
"_file": "generated-library/processes.yaml",
"_cluster": "generated-library",
"attributes": {
"displayName": "specializations/domains/science/nanotechnology/thin-film-deposition",
"description": "Thin Film Deposition Process Optimization - Optimize thin film deposition processes\n(ALD, CVD, PVD) for nanoscale films including precursor delivery, substrate temperature,\nfilm thickness control, conformality validation, and material property characterization\nwith statistical process control implementation.",
"libraryPath": "library/specializations/domains/science/nanotechnology/thin-film-deposition.js",
"specialization": "nanotechnology",
"references": [
"- Atomic Layer Deposition: An Overview: https://pubs.acs.org/doi/10.1021/cr900056b",
"- Chemical vapor deposition (CVD) for nanotechnology: https://www.sciencedirect.com/topics/materials-science/chemical-vapor-deposition",
"- Molecular Beam Epitaxy (MBE): https://www.veeco.com/products/mbe-systems"
],
"example": "const result = await orchestrate('specializations/domains/science/nanotechnology/thin-film-deposition', {\n depositionMethod: 'ALD',\n material: 'Al2O3',\n targetThickness: { value: 10, units: 'nm', tolerance: 0.5 },\n substrate: 'silicon',\n requirements: { conformality: 0.95, temperatureLimit: 300 }\n});",
"usesAgents": [
"thin-film-engineer",
"precursor-specialist",
"thermal-process-engineer",
"process-optimizer",
"deposition-technician",
"conformality-analyst",
"film-characterization-scientist",
"spc-engineer",
"qualification-engineer",
"technical-writer"
]
},
"outgoingEdges": [
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "skill-area:mathematical-reasoning",
"kind": "lib_requires_skill_area",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "skill-area:physics-simulation",
"kind": "lib_requires_skill_area",
"attributes": {
"weight": 0.7
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "skill-area:data-analysis",
"kind": "lib_requires_skill_area",
"attributes": {
"weight": 0.5
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "domain:nanotechnology",
"kind": "lib_applies_to_domain",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "role:research-engineer",
"kind": "lib_involves_role",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "workflow:experiment-design",
"kind": "lib_implements_workflow",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "specialization:nanotechnology",
"kind": "lib_belongs_to_specialization",
"attributes": {
"weight": 0.9
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "lib-agent:nanotechnology--thin-film-engineer",
"kind": "uses_agent",
"attributes": {
"weight": 0.8
}
},
{
"from": "lib-process:nanotechnology--thin-film-deposition",
"to": "lib-agent:meta--technical-writer",
"kind": "uses_agent",
"attributes": {
"weight": 0.8
}
}
],
"incomingEdges": []
}