{
  "id": "lib-process:nanotechnology--nanolithography-process",
  "_kind": "LibraryProcess",
  "_file": "generated-library/processes.yaml",
  "_cluster": "generated-library",
  "attributes": {
    "displayName": "nanolithography-process",
    "description": "Nanolithography Process Development - Develop and optimize nanolithography workflows\n(electron beam, nanoimprint, photolithography) including resist processing, exposure optimization,\npattern transfer, metrology validation, and defect analysis with quality gates for critical\ndimension control and overlay accuracy.",
    "libraryPath": "library/specializations/domains/science/nanotechnology/nanolithography-process.js",
    "specialization": "nanotechnology",
    "references": [
      "- Electron Beam Lithography: https://www.raith.com/technology/e-beam-lithography/\n- Nanoimprint Lithography: https://nanoscience.com/techniques/nanoimprint-lithography/\n- Block Copolymer Lithography: https://www.nature.com/articles/nmat2898"
    ],
    "example": "const result = await orchestrate('specializations/domains/science/nanotechnology/nanolithography-process', {\n  lithographyType: 'electron-beam',\n  targetFeatures: { minimumCD: 20, units: 'nm', pitch: 40, aspectRatio: 3 },\n  substrateType: 'silicon',\n  patternDesign: { type: 'lines-spaces', density: 'dense', area: '10um x 10um' }\n});",
    "usesAgents": [
      "lithography-engineer",
      "resist-specialist",
      "exposure-specialist",
      "lithography-metrologist",
      "etch-specialist",
      "cd-metrologist",
      "defect-analyst",
      "overlay-specialist",
      "process-engineer",
      "technical-writer"
    ]
  },
  "outgoingEdges": [
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "skill-area:mathematical-reasoning",
      "kind": "lib_requires_skill_area",
      "attributes": {
        "weight": 1
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "skill-area:physics-simulation",
      "kind": "lib_requires_skill_area",
      "attributes": {
        "weight": 0.7
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "skill-area:data-analysis",
      "kind": "lib_requires_skill_area",
      "attributes": {
        "weight": 0.5
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "domain:nanotechnology",
      "kind": "lib_applies_to_domain",
      "attributes": {
        "weight": 1
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "role:research-engineer",
      "kind": "lib_involves_role",
      "attributes": {
        "weight": 1
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "workflow:experiment-design",
      "kind": "lib_implements_workflow",
      "attributes": {
        "weight": 1
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "specialization:nanotechnology",
      "kind": "lib_belongs_to_specialization",
      "attributes": {
        "weight": 0.9
      }
    },
    {
      "from": "lib-process:nanotechnology--nanolithography-process",
      "to": "lib-agent:meta--technical-writer",
      "kind": "uses_agent",
      "attributes": {
        "weight": 0.8
      }
    }
  ],
  "incomingEdges": []
}