II.
LibraryProcess JSON
Structured · livelib-process:nanotechnology--directed-self-assembly
directed-self-assembly json
Inspect the normalized record payload exactly as the atlas UI reads it.
{
"id": "lib-process:nanotechnology--directed-self-assembly",
"_kind": "LibraryProcess",
"_file": "generated-library/processes.yaml",
"_cluster": "generated-library",
"attributes": {
"displayName": "directed-self-assembly",
"description": "Directed Self-Assembly Process Development - Develop directed self-assembly workflows\nusing block copolymers or nanoparticle templates including substrate preparation, annealing\noptimization, defect reduction strategies, pattern transfer, and alignment verification\nwith quality gates for feature uniformity.",
"libraryPath": "library/specializations/domains/science/nanotechnology/directed-self-assembly.js",
"specialization": "nanotechnology",
"references": [
"- Block Copolymer Lithography: https://www.nature.com/articles/nmat2898\n- Self-assembly of nanoparticles: https://www.annualreviews.org/doi/10.1146/annurev-physchem-040214-121118\n- DNA Nanotechnology Resources: https://www.dna-origami.org/"
],
"example": "const result = await orchestrate('specializations/domains/science/nanotechnology/directed-self-assembly', {\n dsaSystem: 'PS-b-PMMA',\n targetPattern: { type: 'lamellae', pitch: 28, orientation: 'perpendicular' },\n substrateGuide: { type: 'chemoepitaxy', guidePitch: 84 },\n defectTarget: 0.01\n});",
"usesAgents": [
"dsa-engineer",
"substrate-specialist",
"thin-film-specialist",
"annealing-specialist",
"dsa-technician",
"defect-analyst",
"etch-specialist",
"alignment-specialist",
"uniformity-analyst",
"process-engineer",
"technical-writer"
]
},
"outgoingEdges": [
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "skill-area:mathematical-reasoning",
"kind": "lib_requires_skill_area",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "skill-area:physics-simulation",
"kind": "lib_requires_skill_area",
"attributes": {
"weight": 0.7
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "skill-area:data-analysis",
"kind": "lib_requires_skill_area",
"attributes": {
"weight": 0.5
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "domain:nanotechnology",
"kind": "lib_applies_to_domain",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "role:research-engineer",
"kind": "lib_involves_role",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "workflow:experiment-design",
"kind": "lib_implements_workflow",
"attributes": {
"weight": 1
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "specialization:nanotechnology",
"kind": "lib_belongs_to_specialization",
"attributes": {
"weight": 0.9
}
},
{
"from": "lib-process:nanotechnology--directed-self-assembly",
"to": "lib-agent:meta--technical-writer",
"kind": "uses_agent",
"attributes": {
"weight": 0.8
}
}
],
"incomingEdges": []
}